(2,4- dimethylpentadienyl) (ethylcyclopentadienyl ) ruthenium [ Ru(DMPD)(EtCp )], CAS# 0-0-0 Plasma Enhanced Atomic Layer Deposition Film Publications. Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to.
12/21/2019 · Ru ( DMPD )2 had almost the same vaporizing characteristic as Ru(DMPD)(EtCp ) and showed lower decomposition temperature of 210{degree sign}C than those of Ru(DMPD)(EtCp ), 270{degree sign}C. Ru – based films was deposited from Ru ( DMPD )2 – O2 system. Metallic Ru films were deposited at 400{degree sign}C under the oxygen concentration below 0.25%.
Ru(DMPD)(EtCp ). Furthermore, the incubation time of the films deposited at 275?was longer than that deposited at 350?. This results obviously showed that the incubation time from Ru(DMPD)(EtCp ) was much shorter than that from Ru ( EtCp ) 2. The difference of deposition process for Ru(DMPD)(EtCp ) and Ru ( EtCp ) 2 may be presume that the decomposition, The Ru films from Ru(DMPD)(EtCp ) were deposited more stably than those from Both films consisted of Ru single phase for the entire deposition temperature range. Initial nucleation of Ru films from Ru(DMPD)(EtCp ) was smaller in size and denser than that from Morover the deposition process from Ru(DMPD)(EtCp ) has a much shorter incubation time …
11/1/2017 · Ru(DMPD)(EtCp ) (Tosoh Corporation) was used as the Ru precursor, while oxygen gas was used as the oxygen source. Deposition temperatures of 210 and 300 °C were selected; these two temperatures were respectively located at the lower- and higher-temperature regions in the relationship between the logarithm of the deposition rate after incubation …
The [ Ru ( DMPD ) 2] with two alkyl-substituted linear pentadienyl ligand decomposed at 210 °C which is 60 °C lower than [ Ru(DMPD)(EtCp )]. Thus, it showed that [ Ru ( DMPD ) 2 may be a useful MOCVD precursor. The study 136 showed that [ Ru ( DMPD ) 2] can be used in a wider range of deposition temperature in the transported limited temperature regime as …
12/7/2018 · Ru ( EtCp ) 2 +2 ?7006 0.1759 not available 709 6, 8, 9 Ru (Cp) 2 +2 not available 0.32 not available 270 18 Ru ( DMPD ) 2 +2 ?125 0.023 not available not available 23 (HD)iPrMePhRu 0 ?50 0.15 180?200 275 28 EBCHDRu 0 2 0.186 not available 118 34 EBBDRu 0 6 0.09 not available ?140 33 Ru (DMBD)(CO) 3 0 35 0.065 195?215 62 this work, bis(ethylcyclopentadienyl) ruthenium Ru ( EtCp )2 started to decompose at 350 ?. The decomposition temperature of Ru(DMPD)(EtCp ) was 70 ?lower than that of Ru ( EtCp )2. Because of such difference in decomposition temperature, films deposited from Ru(DMPD)(EtCp ) showed excellent step coverage and high nucleation density at initial growth stage of …
12/7/2018 · Comparison of GPC and resistivity vs temperature for Ru and RuO 2 thermal ALD processes. The 20 s O 2 pulses in green circles (GPC) and green triangles (resistivity) and 2 s O 2 pulses in orange squares (GPC) and orange diamonds (resistivity).
8 Ru ( EtCp ) 2, 9 Ru (thd) 3 10 or Ru ( DMPD ) 2, 11 is typically used in conjunction with molecular oxygen in a combustion chemistry. For the plasma enhanced processes, MO precursors have been used in combination with O 2-plasma (O 2 *), NH 3-plasma (NH 3 *) or a combined N 2 +H 2-plasma ((N 2 +H 2)*) as the reactant. Examples are the RuCp(CO) 2 /O …
